A Novel Method for Visualizing Hair Lipids at the Cell Membrane Complex: Argon Sputter Etching/Scanning Electron Microscopy

The study introduced a novel method using argon sputter etching and scanning electron microscopy to visualize hair lipids at the cell membrane complex (CMC). This method revealed specific circular and stitch patterns associated with melanin granules and the CMC, respectively. The stitch patterns, formed as convex structures, were affected by treatments with organic solvents, indicating that hair lipids are responsible for these formations. The process involved joule heat generation, melting of CMC lipids, and their chemical alteration, leading to the convex structures. This technique allowed for the characterization of hair lipids' fine structure and their roles in human hair.