ToF-SIMS Characterization of the Lipid Layer on the Hair Surface: The Damage Caused by Chemical Treatments and UV Radiation

    January 2011 in “ Surface and interface analysis ”
    Taichi Habe, Noriyuki Tanji, Shigeto Inoue, Masayuki Okamoto, Shinichi Tokunaga, Hiroto Tanamachi
    TLDR Chemical treatments and UV radiation severely damage the lipid layer on hair.
    In this study, researchers used time-of-flight secondary ion mass spectrometry (ToF-SIMS) to examine the effects of chemical treatments and UV radiation on the lipid layer of human hair. They found that fatty acids bound via thioester linkages were more easily removed than those with ester linkages. Specifically, 80% of 18-methyleicosanoic acid (18-MEA), a major lipid component, was removed after a single bleach treatment, and nearly all was gone after three treatments. UV radiation also significantly reduced 18-MEA levels, with over 90% removed after exposure equivalent to three summer months.
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