ToF-SIMS Characterization of the Lipid Layer on the Hair Surface: The Damage Caused by Chemical Treatments and UV Radiation

May 2010 in “ Surface and interface analysis ”

Taichi Habe, Noriyuki Tanji, Shigeto Inoue, Masayuki Okamoto, Shinichi Tokunaga, Hiroto Tanamachi

time-of-flight secondary ion mass spectrometry ToF-SIMS chemical treatments UV radiation lipid layer human hair fatty acids thioester linkages ester linkages 18-methyleicosanoic acid 18-MEA bleach treatment

TLDR Chemical treatments and UV radiation severely damage the lipid layer on hair.

The study utilized Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) to analyze the lipid layer on the hair surface, focusing on the damage caused by chemical treatments and UV radiation. The findings indicated that both chemical treatments and UV exposure significantly degraded the lipid layer, which is crucial for maintaining hair health and integrity. The research highlighted the importance of protecting hair from such damaging factors to preserve its natural lipid composition and overall condition.

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